CAS 12055-23-1
:Hafniumoxid
- Dioxido De Hafnio
- Dioxohafnium
- Dioxyde d'hafnium
- Hafnia
- Hafnia (HfO2)
- Hafnia (HfO<sub>2</sub>)
- Hafnium (IV)�oxide (99.998%-Hf) PURATREM
- Hafnium dioxide
- Hafnium dioxide (HfO2)
- Hafnium dioxide (HfO<sub>2</sub>)
- Hafnium oxide
- Hafnium oxide (HfO2)
- Hafnium oxide (HfO<sub>2</sub>)
- Hafnium(+4) Cation
- Hafniumdioxid
- Hafniumoxideoffwhitepowder
- Hafniumoxidesinteredlumps
- Hafnotrast
- Hf 05
- Hf 05 (oxide)
- Nsc 158931
- Weitere Synonyme anzeigen
Hafnium(IV) oxide, 99.95%, (metals basis excluding Zr), Zr typically <0.5%
CAS:Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi
Formel:HfO2Reinheit:0.5%Molekulargewicht:210.49Hafnium(IV) oxide, 99.9% (metals basis excluding Zr), Zr <0.5%
CAS:Hafnium(IV) oxide is an intermediate. Hafnia is used in optical coatings, and as a high- dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and lab
Formel:HfO2Reinheit:0.5%Molekulargewicht:210.49Hafnium(IV) oxide, 99% (metals basis excluding Zr), Zr <1.5%
CAS:Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi
Formel:HfO2Reinheit:1.5%Farbe und Form:White, PowderMolekulargewicht:210.49Hafnium(IV) oxide, tech.
CAS:Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi
Formel:HfO2Molekulargewicht:210.49Hafnium(IV) oxide, Spectrographic Grade, 99.9% (metals basis excluding Zr), Zr typically <80ppm
CAS:Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi
Formel:HfO2Reinheit:99.9%Molekulargewicht:210.49Hafnium(IV) oxide, 99.995%, (metals basis excluding Zr), Zr typically <0.2%
CAS:Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi
Formel:HfO2Reinheit:0.2%Molekulargewicht:210.49Hafnium(IV) oxide, 99.99% (metals basis excluding Zr), Zr <100ppm
CAS:Hafnium(IV) oxide is used as Intermediates, Paint additives and coating additives, metal Products. And it is also used in optical coatings, as a refractory material in the insulation of such devices as thermocouples. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesa
Formel:HfO2Reinheit:99.99%Molekulargewicht:210.49Hafnium(IV) oxide, 98%
CAS:Hafnium(IV) oxide, 98%
Formel:HfO2Reinheit:98%Farbe und Form:off-white pwdr.Molekulargewicht:210.49Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM
CAS:Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM
Formel:HfO2Reinheit:(99.995%-Hf, <0.15% Zr)Farbe und Form:off-white pwdr.Molekulargewicht:210.49Hafnium(IV) oxide
CAS:Hafnium(IV) oxideReinheit:99.99%,-200meshFarbe und Form:Off-White PowderMolekulargewicht:210.49g/molHafnium(IV) oxide nanopowder, 70nm, 99.9%
CAS:Formel:HfO2Reinheit:≥ 99.9%Farbe und Form:White to tan powder or crystalMolekulargewicht:210.49Hafnium oxide, 99+% (contains max. 4.5% Zr)
CAS:Formel:HfO2Reinheit:≥ 99.0% (sum of Hf and Zr oxides after calcination)Farbe und Form:White powderMolekulargewicht:210.49Hafnium oxide, 99+% (contains max. 0.5% Zr)
CAS:Formel:HfO2Reinheit:≥ 99.0%Farbe und Form:White to off-white powder or crystalsMolekulargewicht:210.49Hafnium oxide, 99.9%
CAS:Formel:HfO2Reinheit:≥ 99.9% (excluding Zr)Farbe und Form:White to off-white powderMolekulargewicht:210.49Hafnium oxide, 99.9%
CAS:Formel:HfO2Reinheit:≥ 99.9% (excluding Zr)Farbe und Form:White powderMolekulargewicht:210.49Ref: IN-DA00HFI1
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