CAS 75-59-2
:Tetramethylammoniumhydroxid
Beschreibung:
Tetramethylammoniumhydroxid (TMAH) ist eine quartäre Ammoniumverbindung mit der chemischen Formel (CH₃)₄NOH. Es tritt typischerweise als farblose, viskose Flüssigkeit oder als Feststoff in reiner Form auf. TMAH ist hochlöslich in Wasser und polaren organischen Lösungsmitteln, was es zu einem vielseitigen Reagenz in verschiedenen chemischen Anwendungen macht. Es wirkt als starke Base aufgrund des Vorhandenseins des Hydroxidions, das es ihm ermöglicht, Säuren leicht zu deprotonieren. TMAH wird häufig in der Halbleiterindustrie zur Entwicklung von Fotolacken und als Katalysator in der organischen Synthese verwendet. Darüber hinaus kann es als Tensid dienen und wird in verschiedenen Laboranwendungen eingesetzt. Es ist jedoch wichtig, TMAH mit Vorsicht zu handhaben, da es giftig ist und schwere Haut- und Augenreizungen verursachen kann. Angemessene Sicherheitsmaßnahmen, einschließlich der Verwendung von persönlicher Schutzausrüstung, sind unerlässlich, wenn man mit dieser Verbindung arbeitet. Seine Stabilität und Reaktivität machen es zu einem wertvollen Werkzeug sowohl in industriellen als auch in Forschungseinrichtungen.
Formel:C4H12N·HO
InChl:InChI=1S/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1
InChI Key:InChIKey=WGTYBPLFGIVFAS-UHFFFAOYSA-M
SMILES:[N+](C)(C)(C)C.[OH-]
Synonyme:- Ammonium Hydroxide, Tetramethyl-
- Ammonium, tetramethyl-, hydroxide
- Ar 300-49
- Az 300Mif
- Az 726
- Az 726Mif
- Az-Mif 300
- Cd 26
- Cpd 18
- Hidroxido De Tetrametilamonio
- Hydroxyde de tetramethylammonium
- Idrossido di tetrametilammonio
- L 09658
- Ldd 26
- Ldd 26W
- Megaposit CD 14
- Megaposit MF 24A
- Methanaminium, N,N,N-trimethyl-, hydroxide (1:1)
- Mf 24A
- Mf 319
- Mf 321
- Mf-Cd 26
- Microposit CD 26
- Microposit MF 319
- Microposit MF 321
- Microposit MF-CD 26
- Mif 726
- Nmd 3
- Nmw-W
- Ocg 934
- Ocg 945
- Ocg-Opd 262
- Opd 262
- Opd 5262
- Photoresist ma-D 525
- Prs 2000
- RD 6 (developer)
- Tetramethylammonium Hydroxide
- Tetramethylammoniumhydroxid
- Tmah
- Tmah 25
- Tokuso SD 20
- Tokuso SD 25
- Un3423
- テトラメチルアンモニウム=ヒドロキシド
- nmd3
- hydroxydedetetramethylammonium
- n,n,n-trimethyl-methanaminiuhydroxide
- N,N,N-Trimethylmethanaminium Hydroxide
- Methanaminium, N,N,N-trimethyl-, hydroxide
- megapositcd14
- Methanaminium,N,N,N-trimethyl-,hydroxide
- Tetramethyl ammonium hydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE SOL., 6% IN PROPYLENEGLYCOL
- tetramethyl-ammoniuhydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE, 1.0M SOLN . IN H2O, A.C.S. REAGENT
- tetramethylammoniumhydroxide,10%solutioninwater
- Tetramethyl ammonium
- tetramethylammoniumhydroxide,solution
- TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION, ~10% IN WATER
- Tetramethylaminonium hydroxide
- ocg945
- TETRAMETHYLAMMONIUM HYDROXIDE, 10 WT. % SOLUTION IN WATER
- Weitere Synonyme anzeigen
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20 Produkte.
Tetramethylammonium Hydroxide (10% in Water)
CAS:Formel:C4H13NOFarbe und Form:Colorless to Almost colorless clear liquidMolekulargewicht:91.15Tetramethylammonium Hydroxide (10% in Methanol) [for Photoresist Research]
CAS:Formel:C4H13NOFarbe und Form:Colorless to Almost colorless clear liquidMolekulargewicht:91.15Tetramethylammonium Hydroxide (ca. 25% in Water)
CAS:Formel:C4H13NOFarbe und Form:Colorless to Light yellow clear liquidMolekulargewicht:91.15Tetramethylammonium hydroxide, 1.0 M aq. soln., ACS
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Formel:C4H13NOFarbe und Form:Colorless, LiquidMolekulargewicht:91.15Tetramethylammonium hydroxide, 25% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds appl</p>Formel:C4H13NOReinheit:99.9999%Farbe und Form:LiquidMolekulargewicht:91.15Tetramethylammonium hydroxide, 25% w/w in methanol
CAS:<p>Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanopart</p>Formel:C4H13NOFarbe und Form:Clear colorless to pale yellow, LiquidMolekulargewicht:91.15Tetramethylammonium hydroxide, 2.38% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Formel:C4H13NOReinheit:99.9999%Molekulargewicht:91.15Tetramethylammonium hydroxide, 25% solution
CAS:Formel:C4H13NOFarbe und Form:Clear, colourless to yellow solutionMolekulargewicht:91.15Tetramethylammonium Hydroxide (10% in Methanol)
CAS:Formel:C4H13NOFarbe und Form:Colorless to Light yellow clear liquidMolekulargewicht:91.15Tetramethylammonium hydroxide, 10% aqueous solution
CAS:Formel:C4H13NOFarbe und Form:Liquid, No data available.Molekulargewicht:91.154Tetramethylammonium Hydroxide (25% w/w solution in Water)
CAS:<p>Applications Tetramethylammonium Hydroxide is used to prepare a new family of silicate/aluminosilicate mesoporous molecular sieves.<br> Not a dangerous good if item is equal to or less than 1g/ml and there is less than 100g/ml in the package<br>References Beck, J., et al.: J. Am. Chem. Soc., 114, 10834 (1992).<br></p>Formel:C4H12N·HOFarbe und Form:Single SolutionMolekulargewicht:91.15Tetramethylammonium Hydroxide-13C3
CAS:Kontrolliertes ProduktFormel:CC3H12N•OHFarbe und Form:NeatMolekulargewicht:77.12 + 17.008Tetramethylammonium hydroxide, 25% aqueous solution
CAS:Tetramethylammonium hydroxide is a strong base that is used in analytical chemistry for the quantitative determination of zirconium. It is an analytical reagent and has a pH of 14. Tetramethylammonium hydroxide forms complexes with metals such as zirconium and titanium, which are then analyzed by various methods such as atomic absorption spectroscopy, x-ray fluorescence spectroscopy, and inductively coupled plasma mass spectrometry. The optimum concentration of tetramethylammonium hydroxide for this application is approximately 25%. Tetramethylammonium hydroxide reacts with p-nitrophenyl phosphate to form a pink product, which can be detected by colorimetric analysis. This reaction also produces hydrogen fluoride gas, which must be removed before the solution can be used again. Tetramethylammonium hydroxide reacts with ammonium to form tetramethylammonium ion and water. It also reactsFormel:C4H13NOReinheit:Min. 95%Farbe und Form:Clear LiquidMolekulargewicht:91.15 g/molTetramethylammonium Hydroxide 25% aqueous solution pure
CAS:Formel:C4H13NOReinheit:~25%Farbe und Form:Clear, Colourless to pale yellow, LiquidMolekulargewicht:91.15Tetramethylammonium Hydroxide 25% in methanol pure
CAS:Formel:C4H13NOReinheit:~25%Farbe und Form:Clear, Pale yellow, LiquidMolekulargewicht:91.15Tetramethylammonium Hydroxide 10% Aq. Solution pure
CAS:Formel:C4H13NOReinheit:~10%Farbe und Form:Clear, Colourless to pale yellow tinted, LiquidMolekulargewicht:91.15Tetramethylammonium Hydroxide 25% aqueous solution, VLSI Semiconductor Grade
CAS:Formel:C4H13NOFarbe und Form:Clear, Colourless, Liquid, < 10Molekulargewicht:91.15Tetramethylammonium Hydroxide 1M Aq. Solution ACS
CAS:Formel:C4H13NOFarbe und Form:Clear, Colourless, Liquid, max. 10Molekulargewicht:91.15Tetramethylammonium Hydroxide 0.1N in isopropanol/ methanol extrapure
CAS:Formel:C4H13NOFarbe und Form:Clear, Colourless to slight yellow tinted, LiquidMolekulargewicht:91.15
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