Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)

CAS: 7439-89-6

Ref. 02-040855

Produktinformation

• Name: Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
• Synonyme: 300A, 3ZhP, 4100Po434, 9A4Ii, Actino-iron, Basf-Ew, CM, Ci-Cs, Cip-Cm, DH, DKP, EFV, ES, Eisen, FEE, Fe(HQ), Fer, Ferricon, Ferronyl, Ferrovit, HL, HQ, HS, Hierro, IronchipsNmmthickxmmxmm, IronfoilNmmthickxmmwide, IronlumpNxxmmanddownirregular, IronpowderNmesh, IronpowderNmicron, Ironpowderelectrolytic, Loha, Metalet, Mondi, Nepy, PZhO, Pdr-Cm, RKH, S1640, SM, SQ, Stainlesssteelfoiltypexmm, Tec-Ball

Beschreibung

Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

• Marke: Alfa Aesar By Thermo Fisher Scientific

Chemische Eigenschaften

• Reinheit: 99.95%