Produktinformation
Name:TETRAKIS(DIMETHYLAMINO)SILANE
Synonyme:
- 4DMAS
Marke:Gelest
Beschreibung:ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetrakis(dimethylamino)silane; Tetrakis(dimethylamido)silane; Octamethylsilanetetramine; N,N,N',N',N'',N'',N''',N'''-Octamethylsilanetetramine
Undergoes transamination reactionsReacts with chromophores to form NLO active hybrid organic-inorganics
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetrakis(dimethylamino)silane; Tetrakis(dimethylamido)silane; Octamethylsilanetetramine; N,N,N',N',N'',N'',N''',N'''-Octamethylsilanetetramine
Undergoes transamination reactionsReacts with chromophores to form NLO active hybrid organic-inorganics
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Chemische Eigenschaften
Molekulargewicht:204.39
Formel:C8H24N4Si
Reinheit:97%
Farbe/Form:Straw Liquid