CAS 10026-04-7
:Silano, tetracloruro
- LS 10 (silane)
- Ls 10
- Perchlorosilane
- Siliciumtetrachlorid
- Silicon Chloride
- Silicon Tetrachloride
- Silicon chloride (SiCl4)
- Silicon chloride (SiCl<sub>4</sub>)
- Tetrachlorosilane
- Tetrachlorosilicon
- Tetrachlorure de silicium
- Tetracloruro De Silicio
- 1,1,1-trichloroethane
- Silane, tetrachloro-
- SiliconIVchloridecolorlessliq
- Silico tetrachloride
- Tetrachorosilane
- SiliconchloridefiberopticgradePURATREMcolorless
- SILICON(IV) CHLORIDE
- silicio(tetraclorurodi)
- Chlorid kremicity
- Silicium(tetrachlorure de)
- chloridkremicity
- silicium(tetrachlorurede)(french)
- Siliciumtetrachloride
- silicium(tetrachlorurede)
- SIC-L(TM)
- Silicio(tetracloruro di)
- CT1800
- SiCl4
- Ver más sinónimos
Tetrachlorosilane
CAS:Fórmula:SiCl4Pureza:>98.0%(T)Forma y color:Colorless to Light yellow clear liquidPeso molecular:169.89Silicon(IV) chloride, 99%
CAS:Silicon(IV) chloride is used as an intermediate in the manufacture of polysilicon. It is also used in the semiconductors industry, photovoltaic cells and in the production of optical fibers. Its derivatives like trichlorosilane and silane are used in the Siemens process. This Thermo Scientific ChemiFórmula:Cl4SiPureza:99%Forma y color:LiquidPeso molecular:169.89Silicon(IV) chloride, 99.998% (metals basis)
CAS:Silicon(IV) chloride is used as semiconductor grade. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not chFórmula:Cl4SiPureza:99.998%Peso molecular:169.89Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM
CAS:Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM
Fórmula:SiCl4Pureza:(99.9999%-Si)Forma y color:colorless liq.Peso molecular:169.90TETRACHLOROSILANE, 99.99+%
CAS:Fórmula:Cl4SnPureza:99.99%Forma y color:Straw LiquidPeso molecular:169.9TETRACHLOROSILANE, 98%
CAS:ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetrachlorosilane; Silicon chloride; Silicon tetrachloride
Viscosity: 0.35 cStΔHform: -640 kJ/molΔHvap: 31.8 kJ/molΔHfus: 45.2 J/gSurface tension: 19.7 mN/mDielectric constant: 2.40Vapor pressure, 20 °C: 194 mmCritical pressure: 37.0 atmCritical temperature: 234 °CCoefficient of thermal expansion: 1.1 x 10-3Specific heat: 0.84 J/g/°Reaction with living alkali metal terminated polymers results in star polymersPrimary industrial use - combustion with hydrogen and air to give fumed silicaEnantioselectively opens stilbine epoxides to trichlorosilylated chlorohydrinsPromotes the reaction of aldehydes with isocyanidesFórmula:Cl4SnPureza:98%Forma y color:Straw LiquidPeso molecular:169.9Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM, 98-0147, contained in a 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD
CAS:Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM, 98-0147, contained in a 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD
Fórmula:SiCl4Pureza:(99.9999%-Si)Forma y color:colorless liq.Peso molecular:169.90





