Tetraethyl orthosilicate - 28% SiO2
CAS: 78-10-4
Ref. 3D-FT54918
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Información del producto
- Ethyl orthosilicateOrthosilicic acid tetraethyl ester
- Adc 68
- Ay 43-101
- Colcoat 6P
- Conservare OH
- Dynasil A
- Dynasylan A
- Dynasylan Silbond Condensed
- Dynasylan TEOS-UHP
- ES 100 (silicate)
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- ES 28 (ester)
- Ecos 1
- Ekos 1
- Es 100
- Es 140
- Es 28
- Es 28P
- Es 45
- Estel 1000
- Ethyl Silicate
- Ethyl Silicate 45
- Ethyl Silicate A
- Ethyl orthosilicate
- Ethyl silicate ((EtO)4Si)
- Ethyl silicate ((EtO)<sub>4</sub>Si)
- Ethyl silicate 28
- Ethyl silicate 28P
- Ethyl silicate PHASE
- KIEM-Silex OH
- Kbe 04
- Kbe 14
- Kbm 06
- Ls 2340
- Ls 2430
- N 100
- N 100 (silicate)
- Nsc 4790
- Orthosilicate de tetraethyle
- Ortosilicato De Tetraetilo
- Peteos
- Pg 121
- Remmers 300
- SILICIC ACID (H4SiO4), TETRAETHYL ESTER, HYDROLYZED
- Si 28
- Si 28 (coupling agent)
- Si 42
- Silane, tetraethoxy-
- Silicic Acid, Tetraethyl Ester
- Silicic acid (H<sub>4</sub>SiO<sub>4</sub>), tetraethyl ester
- Silicon ethoxide
- Silicon ethoxide (Si(OEt)4)
- Silicon ethoxide (Si(OEt)<sub>4</sub>)
- Silicon tetraethoxide
- Silicon tetraethoxide (Si(OC2H5)4)
- Silicon tetraethoxide (Si(OC<sub>2</sub>H<sub>5</sub>)<sub>4</sub>)
- Silicon tetraethoxide (Si(OEt)4)
- Silicon tetraethoxide (Si(OEt)<sub>4</sub>)
- Silikan L
- Silikat TES 28
- Silquest SIT 7110.0
- Silquest TEOS Pure
- Silres BSOH 100
- Sit 7110.0
- Soteos
- Ssg-Hb 21N
- Steinfestiger OH
- T 0100
- T 0100 (ester)
- T 1126
- T 1807
- TEOS Pure
- Tanapel DSR
- Teos
- Tes 28
- Tetraaethyl-Orthosilicat
- Tetraethoxy orthosilicate
- Tetraethoxy silane
- Tetraethoxysilane
- Tetraethoxysilicon
- Tetraethoxysilicon(IV)
- Tetraethyl Orthosilicate
- Tetraethyl Silicate
- Tetraethylorthosilicat
- Tetraethylorthosilicate
- Tsl 8124
- Tslb 124
- Unisilan 74
- Wd 932
- Z 6697
Tetraethyl orthosilicate is a compound with the formula SiO2. It is a colorless, high-melting solid that reacts with water to form silicic acid and hydrogen fluoride. Tetraethyl orthosilicate is used as an additive in paint, rubber, and some metalworking fluids. The reaction mechanism for this compound is not well understood but it has been proposed that the formation of tetraethyl orthosilicate involves the following steps: 1) decomposition of hydrogen fluoride, 2) reaction of silicon with water to form silica and hydrogen gas, 3) reaction of silica with ethylene to form tetraethyl orthosilicate. Tetraethyl orthosilicate has a high resistance to hydrolysis or oxidation, which makes it useful for biomedical applications such as coatings for drug-delivery devices or implants. This material also exhibits biochemical properties that are similar to those found in human serum and can be used as an animal model for
Propiedades químicas
Consulta técnica sobre: 3D-FT54918 Tetraethyl orthosilicate - 28% SiO2
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