Información del producto
Nombre:
TRI-t-PENTOXYSILANOL, 97%
Sinónimos:
- Tris(tert-pentoxy)silanol
- Silicic acid (H<sub>4</sub>SiO<sub>4</sub>), tris(1,1-dimethylpropyl) ester
- Tri-T-Pentoxysilanol
- Tris(1,1-Dimethylpropyl) Hydrogen Orthosilicate
- Tris(2-methyl-2-butoxy)silanol
- Tris(tert-pentyloxy)silanol
- tert-Pentyl alcohol, triester with silicic acid (H<sub>4</sub>SiO<sub>4</sub>)
Descripción:
ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tri-t-pentoxysilanol; Tri-t-pentylsilicate; Tri-t-amyloxysilanol
Employed in ALD
Aviso:
Nuestros productos están destinados únicamente para uso en laboratorio. Para cualquier otro uso, por favor contáctenos.
Marca:
Gelest
Almacenamiento de larga duración:
Notas:
Propiedades químicas
Peso molecular:
306.51
Fórmula:
C15H34O4Si
Pureza:
97%
Color/Forma:
Liquid
MDL:
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Punto de ebullición:
Punto de inflamabilidad:
Densidad:
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Código HS:
