Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)

CAS : 7439-89-6

Ref. 02-040855

Informations sur le produit

• Nom: Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
• Synonymes: 300A, 3ZhP, 4100Po434, 9A4Ii, Actino-iron, Basf-Ew, CM, Ci-Cs, Cip-Cm, DH, DKP, EFV, ES, Eisen, FEE, Fe(HQ), Fer, Ferricon, Ferronyl, Ferrovit, HL, HQ, HS, Hierro, IronchipsNmmthickxmmxmm, IronfoilNmmthickxmmwide, IronlumpNxxmmanddownirregular, IronpowderNmesh, IronpowderNmicron, Ironpowderelectrolytic, Loha, Metalet, Mondi, Nepy, PZhO, Pdr-Cm, RKH, S1640, SM, SQ, Stainlesssteelfoiltypexmm, Tec-Ball

Description

Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

• Marque: Alfa Aesar By Thermo Fisher Scientific

Propriétés chimiques

• Degré de pureté: 99.95%