Informations sur le produit
Nom:NICKEL(II) 2,4-PENTANEDIONATE
Marque:Gelest
Description :ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Nickel(II) 2,4-pentanedionate; Acetylacetonate: nickel acac; Bis(pentane-2,4-dionato-O,O')nickel; Nickel(II)bis(4-hydroxy-2-pentanolate)
Metal content: 22.5-23.6% NiΔHsub: 16.5 kcal/molVapor pressure, 145 °C: 0.01 mmColor: green - turns turquoise on absorption of 3 mol H2OSolubility, ethanol: 27 g/LSolubility, methoxyethoxyethanol: 70 g/LSolubility, toluene: 85 g/LSolubility, water: 11.0 g/LUV max: 265-298 nmTrimeric compoundWater removed by azeotropic distillation with tolueneNMR shift reagentCatalyzes conjugate addition of alkynyl aluminums to enonesCatalyzes coupling of Grignard reagents to give biarylsCatalyzes Grignard additions to silyl enol ethers forming alkenesThermochromic effect in non-coordinating solvents at 200 °CUV stabilizer for polyphenylene sulfideCatalyzes coupling of dialkylzincs with alkyl iodidesIntermediate for Ni nanoparticles by reduction of NaBH4Forms Ni3C nanocrystalas by thermolysis in oleylamine
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Nickel(II) 2,4-pentanedionate; Acetylacetonate: nickel acac; Bis(pentane-2,4-dionato-O,O')nickel; Nickel(II)bis(4-hydroxy-2-pentanolate)
Metal content: 22.5-23.6% NiΔHsub: 16.5 kcal/molVapor pressure, 145 °C: 0.01 mmColor: green - turns turquoise on absorption of 3 mol H2OSolubility, ethanol: 27 g/LSolubility, methoxyethoxyethanol: 70 g/LSolubility, toluene: 85 g/LSolubility, water: 11.0 g/LUV max: 265-298 nmTrimeric compoundWater removed by azeotropic distillation with tolueneNMR shift reagentCatalyzes conjugate addition of alkynyl aluminums to enonesCatalyzes coupling of Grignard reagents to give biarylsCatalyzes Grignard additions to silyl enol ethers forming alkenesThermochromic effect in non-coordinating solvents at 200 °CUV stabilizer for polyphenylene sulfideCatalyzes coupling of dialkylzincs with alkyl iodidesIntermediate for Ni nanoparticles by reduction of NaBH4Forms Ni3C nanocrystalas by thermolysis in oleylamine
Avis:Nos produits sont destinés uniquement à un usage en laboratoire. Pour tout autre usage, veuillez nous contacter.
Propriétés chimiques
Masse moléculaire :256.91
Formule :C10H14NiO4
Couleur/Forme :Green-Turquoise Solid