Informations sur le produit
Nom:DI(t-BUTYLAMINO)SILANE
Synonymes :
- BIS(tert-BUTYLAMINO)SILANE
Marque:Gelest
Description :ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Di(t-butylamino)silane; Bis(tert-butylamino)silane; N,N'-Di-t-butylsilanediamine; BTBAS
Lithiation leads to polyhedral silazanes
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Di(t-butylamino)silane; Bis(tert-butylamino)silane; N,N'-Di-t-butylsilanediamine; BTBAS
Lithiation leads to polyhedral silazanes
Avis:Nos produits sont destinés uniquement à un usage en laboratoire. Pour tout autre usage, veuillez nous contacter.
Propriétés chimiques
Masse moléculaire :174.36
Formule :C8H22N2Si
Degré de pureté :97%
Couleur/Forme :Straw Liquid