ISOTETRASILANE

CAS : 13597-87-0

Ref. 3H-SII6463.4

Informations sur le produit

• Nom: ISOTETRASILANE
• Synonymes: (TRISILYL)SLANE
• Marque: Gelest
• Description: Volatile Higher SilaneVolatile higher silanes are low temperature, high deposition rate precursors. By appropriate selection of precursor and deposition conditions, silicon deposition can be shifted from amorphous hydrogenated silicon toward microcrystalline silicon structures. As the number of silicon atoms increases beyond two, electrons are capable of sigma–sigma bond conjugation. The dissociative adsorption of two of the three hydrogen atoms on terminal silicon atoms has a lower energy barrier.Isotetrasilane; (Trisilyl)silane; 2-SilyltrisilanePYROPHORICAIR TRANSPORT FORBIDDEN?Hvap: 32.5 kJ/molPrecursor for low temp. epitaxy of doped crystalline siliconEmployed in low temperature CVD of amorphous silicon

Propriétés chimiques

• Masse moléculaire: 122.42
• Formule: H₁₀Si₄
• Degré de pureté: 98%
• Couleur/Forme: Colourless Liquid