Informations sur le produit
Nom :
TRI-t-PENTOXYSILANOL, 97%
Synonymes :
- Tris(tert-pentoxy)silanol
- Silicic acid (H<sub>4</sub>SiO<sub>4</sub>), tris(1,1-dimethylpropyl) ester
- Tri-T-Pentoxysilanol
- Tris(1,1-Dimethylpropyl) Hydrogen Orthosilicate
- Tris(2-methyl-2-butoxy)silanol
- Tris(tert-pentyloxy)silanol
- tert-Pentyl alcohol, triester with silicic acid (H<sub>4</sub>SiO<sub>4</sub>)
Description :
ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tri-t-pentoxysilanol; Tri-t-pentylsilicate; Tri-t-amyloxysilanol
Employed in ALD
Avis:
Nos produits sont destinés uniquement à un usage en laboratoire. Pour tout autre usage, veuillez nous contacter.
Marque:
Gelest
Stockage à long terme :
Notes :
Propriétés chimiques
Masse moléculaire :
306.51
Formule :
C15H34O4Si
Degré de pureté :
97%
Couleur/Forme :
Liquid
MDL:
Point de fusion :
Point d'ébullition :
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