AC-13847 - tetramethylsilane-999-nmr-grade | 75-76-3

<p>Tetramethylsilane is a chemical compound that consists of four methyl groups bound to a central silicon atom. Tetramethylsilane has been used in the study of mammalian tissue and in the production of hydrogen gas. It is also used in the analysis of proteins by mass spectrometry. The hydroxyl group on tetramethylsilane reacts with other compounds (e.g., sulfur dioxide) to form an addition compound. Photomultiplier tubes use tetramethylsilane as a reactant, which can be used as a reference gas for flow systems. Tetramethylsilane has high values that are typically found in argon, which can be used to determine whether or not it is present as an impurity.</p>

<p>Tetramethylsilane is used as a building block in organometallic chemistry. It acts as a by-product in the production of methyl chlorosilanes. Also, it serves as a precursor to silicon dioxide or silicon carbide. It is used as internal reference standard for the calibration of chemical sift for 1, 13</p>

<p>Tetramethylsilane, 99.9+% (NMR grade)</p>

<p>Tetramethylsilane; 4MS; TMS<br>NMR gradeViscosity: 0.4 cSt?Hcomb: 3,851 kJ/mol?Hform: -232 kJ/mol?Hvap: 26.8 kJ/mol?Hfus: 6.7 kJ/molPhotoionization threshold: 8.1 eVCe: 1.838 x 10-3Vapor pressure, 20 °C: 589 mmCritical temperature: 185 °CCritical pressure: 33 atmHeat capacity: 195.2 Jmol-1K-1Dielectric constant: 1.92Intermediate for ?-SiC:H thin films by PECVD<br></p>

TMS 99.9% - NMR GRADE