CAS 1066-77-9
:TETRAKIS(DIMETILAMINO)STAGNO
- Octamethylstannanetetraamine
- Tin (Iv) Dimethylamide
- Tetrakis-(Dimethylamino-)-Stannane
- Tetrakis(dimethylamine)tin
- Tetrakis(dimethylamido)tin(IV)
- Tin(4+) Tetrakis(Dimethylazanide)
Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM
CAS:Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM
Formula:SnN(CH3)2Purezza:(99.99%-Sn)Colore e forma:colorless to pale-yellow liq.Peso molecolare:295.01TETRAKIS(DIMETHYLAMINO)TIN
CAS:ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetrakis(dimethylamino)tin; Octamethylstannanetetraamine; Tin IV dimethylamide
Reacts with tris(aminoalkyl)amines, yielding azastannatranesFormula:C8H24N4SnColore e forma:Pale Yellow LiquidPeso molecolare:294.99Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM, 50-1815, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
CAS:Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM, 50-1815, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
Formula:SnN(CH3)2Purezza:(99.99% Sn)Colore e forma:colorless to pale-yellow liq.Peso molecolare:295.01

