CAS 75-59-2
:Hidróxido de tetrametilamônio
Descrição:
Hidróxido de tetrametilamônio (TMAH) é um composto de amônio quaternário com a fórmula química (CH₃)₄NOH. Geralmente é encontrado como um líquido incolor e viscoso ou como um sólido em sua forma pura. TMAH é altamente solúvel em água e em solventes orgânicos polares, tornando-se um reagente versátil em várias aplicações químicas. Atua como uma base forte devido à presença do íon hidróxido, que permite desprotonar ácidos facilmente. TMAH é comumente usado na indústria de semicondutores para o desenvolvimento de fotossensores e como catalisador na síntese orgânica. Além disso, pode servir como surfactante e é utilizado em várias aplicações laboratoriais. No entanto, é importante manusear o TMAH com cuidado, pois é tóxico e pode causar irritação severa na pele e nos olhos. Medidas de segurança adequadas, incluindo o uso de equipamentos de proteção individual, são essenciais ao trabalhar com este composto. Sua estabilidade e reatividade o tornam uma ferramenta valiosa tanto em ambientes industriais quanto de pesquisa.
Fórmula:C4H12N·HO
InChI:InChI=1S/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1
Chave InChI:InChIKey=WGTYBPLFGIVFAS-UHFFFAOYSA-M
SMILES:[N+](C)(C)(C)C.[OH-]
Sinónimos:- Ammonium Hydroxide, Tetramethyl-
- Ammonium, tetramethyl-, hydroxide
- Ar 300-49
- Az 300Mif
- Az 726
- Az 726Mif
- Az-Mif 300
- Cd 26
- Cpd 18
- Hidroxido De Tetrametilamonio
- Hydroxyde de tetramethylammonium
- Idrossido di tetrametilammonio
- L 09658
- Ldd 26
- Ldd 26W
- Megaposit CD 14
- Megaposit MF 24A
- Methanaminium, N,N,N-trimethyl-, hydroxide (1:1)
- Mf 24A
- Mf 319
- Mf 321
- Mf-Cd 26
- Microposit CD 26
- Microposit MF 319
- Microposit MF 321
- Microposit MF-CD 26
- Mif 726
- Nmd 3
- Nmw-W
- Ocg 934
- Ocg 945
- Ocg-Opd 262
- Opd 262
- Opd 5262
- Photoresist ma-D 525
- Prs 2000
- RD 6 (developer)
- Tetramethylammonium Hydroxide
- Tetramethylammoniumhydroxid
- Tmah
- Tmah 25
- Tokuso SD 20
- Tokuso SD 25
- Un3423
- テトラメチルアンモニウム=ヒドロキシド
- nmd3
- hydroxydedetetramethylammonium
- n,n,n-trimethyl-methanaminiuhydroxide
- N,N,N-Trimethylmethanaminium Hydroxide
- Methanaminium, N,N,N-trimethyl-, hydroxide
- megapositcd14
- Methanaminium,N,N,N-trimethyl-,hydroxide
- Tetramethyl ammonium hydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE SOL., 6% IN PROPYLENEGLYCOL
- tetramethyl-ammoniuhydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE, 1.0M SOLN . IN H2O, A.C.S. REAGENT
- tetramethylammoniumhydroxide,10%solutioninwater
- Tetramethyl ammonium
- tetramethylammoniumhydroxide,solution
- TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION, ~10% IN WATER
- Tetramethylaminonium hydroxide
- ocg945
- TETRAMETHYLAMMONIUM HYDROXIDE, 10 WT. % SOLUTION IN WATER
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20 produtos.
Tetramethylammonium Hydroxide (10% in Water)
CAS:Fórmula:C4H13NOCor e Forma:Colorless to Almost colorless clear liquidPeso molecular:91.15Tetramethylammonium Hydroxide (10% in Methanol) [for Photoresist Research]
CAS:Fórmula:C4H13NOCor e Forma:Colorless to Almost colorless clear liquidPeso molecular:91.15Tetramethylammonium Hydroxide (ca. 25% in Water)
CAS:Fórmula:C4H13NOCor e Forma:Colorless to Light yellow clear liquidPeso molecular:91.15Tetramethylammonium hydroxide, 1.0 M aq. soln., ACS
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Fórmula:C4H13NOCor e Forma:Colorless, LiquidPeso molecular:91.15Tetramethylammonium hydroxide, 25% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds appl</p>Fórmula:C4H13NOPureza:99.9999%Cor e Forma:LiquidPeso molecular:91.15Tetramethylammonium hydroxide, 25% w/w in methanol
CAS:<p>Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanopart</p>Fórmula:C4H13NOCor e Forma:Clear colorless to pale yellow, LiquidPeso molecular:91.15Tetramethylammonium hydroxide, 2.38% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Fórmula:C4H13NOPureza:99.9999%Peso molecular:91.15Tetramethylammonium hydroxide, 25% solution
CAS:Fórmula:C4H13NOCor e Forma:Clear, colourless to yellow solutionPeso molecular:91.15Tetramethylammonium Hydroxide (10% in Methanol)
CAS:Fórmula:C4H13NOCor e Forma:Colorless to Light yellow clear liquidPeso molecular:91.15Tetramethylammonium hydroxide, 10% aqueous solution
CAS:Fórmula:C4H13NOCor e Forma:Liquid, No data available.Peso molecular:91.154Tetramethylammonium Hydroxide (25% w/w solution in Water)
CAS:<p>Applications Tetramethylammonium Hydroxide is used to prepare a new family of silicate/aluminosilicate mesoporous molecular sieves.<br> Not a dangerous good if item is equal to or less than 1g/ml and there is less than 100g/ml in the package<br>References Beck, J., et al.: J. Am. Chem. Soc., 114, 10834 (1992).<br></p>Fórmula:C4H12N·HOCor e Forma:Single SolutionPeso molecular:91.15Tetramethylammonium Hydroxide-13C3
CAS:Produto ControladoFórmula:CC3H12N•OHCor e Forma:NeatPeso molecular:77.12 + 17.008Tetramethylammonium hydroxide, 25% aqueous solution
CAS:<p>Tetramethylammonium hydroxide is a strong base that is used in analytical chemistry for the quantitative determination of zirconium. It is an analytical reagent and has a pH of 14. Tetramethylammonium hydroxide forms complexes with metals such as zirconium and titanium, which are then analyzed by various methods such as atomic absorption spectroscopy, x-ray fluorescence spectroscopy, and inductively coupled plasma mass spectrometry. The optimum concentration of tetramethylammonium hydroxide for this application is approximately 25%. Tetramethylammonium hydroxide reacts with p-nitrophenyl phosphate to form a pink product, which can be detected by colorimetric analysis. This reaction also produces hydrogen fluoride gas, which must be removed before the solution can be used again. Tetramethylammonium hydroxide reacts with ammonium to form tetramethylammonium ion and water. It also reacts</p>Fórmula:C4H13NOPureza:Min. 95%Cor e Forma:Clear LiquidPeso molecular:91.15 g/molTetramethylammonium Hydroxide 25% aqueous solution pure
CAS:Fórmula:C4H13NOPureza:~25%Cor e Forma:Clear, Colourless to pale yellow, LiquidPeso molecular:91.15Tetramethylammonium Hydroxide 25% in methanol pure
CAS:Fórmula:C4H13NOPureza:~25%Cor e Forma:Clear, Pale yellow, LiquidPeso molecular:91.15Tetramethylammonium Hydroxide 10% Aq. Solution pure
CAS:Fórmula:C4H13NOPureza:~10%Cor e Forma:Clear, Colourless to pale yellow tinted, LiquidPeso molecular:91.15Tetramethylammonium Hydroxide 25% aqueous solution, VLSI Semiconductor Grade
CAS:Fórmula:C4H13NOCor e Forma:Clear, Colourless, Liquid, < 10Peso molecular:91.15Tetramethylammonium Hydroxide 1M Aq. Solution ACS
CAS:Fórmula:C4H13NOCor e Forma:Clear, Colourless, Liquid, max. 10Peso molecular:91.15Tetramethylammonium Hydroxide 0.1N in isopropanol/ methanol extrapure
CAS:Fórmula:C4H13NOCor e Forma:Clear, Colourless to slight yellow tinted, LiquidPeso molecular:91.15








