Informação sobre produto
Nome:DI(t-BUTYLAMINO)SILANE
Sinónimos:
- BIS(tert-BUTYLAMINO)SILANE
Marca:Gelest
Descrição:ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Di(t-butylamino)silane; Bis(tert-butylamino)silane; N,N'-Di-t-butylsilanediamine; BTBAS
Lithiation leads to polyhedral silazanes
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Di(t-butylamino)silane; Bis(tert-butylamino)silane; N,N'-Di-t-butylsilanediamine; BTBAS
Lithiation leads to polyhedral silazanes
Aviso:Os nossos productos estão destinados exclusivamente para uso em laboratório. Para qualquer outra aplicação, por favor entre em contacto.
Propriedades químicas
Peso molecular:174.36
Fórmula:C8H22N2Si
Pureza:97%
Cor/forma:Straw Liquid