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Compounds and Consumables for Thin-Film Deposition (CVD, ALD)

In this category, you will find a variety of compounds and consumables specifically designed for thin-film deposition techniques such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD). These high-purity materials are essential for creating precise and uniform thin films in semiconductor manufacturing, photovoltaics, and advanced coatings. At CymitQuimica, we offer a comprehensive selection of high-quality compounds and consumables to support your thin-film deposition processes.

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Subcategories of "Compounds and Consumables for Thin-Film Deposition (CVD, ALD)"

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Bis(pentamethylcyclopentadienyl)osmium, 99% (99.9%-Os) (Decamethylosmocene)


Discontinued product
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Phosphorus(III) chloride, 98+%


Discontinued product
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Tungsten carbonyl, 99% (<0.1%-Mo)


Discontinued product
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Bis(cyclopentadienyl)osmium, 99% (99.9%-Os) (Osmocene)


Discontinued product
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Chromium carbonyl, sublimed, 99%


Ref: 08-24-0180

5gDiscontinuedRequest information
25gDiscontinuedRequest information
100gDiscontinuedRequest information
500gDiscontinuedRequest information
Discontinued product
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Tungsten carbonyl, 99% (99.9+%-W) sublimed


Discontinued product
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Osmium carbonyl, 99%


Discontinued product
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Chromium carbonyl, 98+%


Discontinued product
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Nickel carbonyl


Discontinued product
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