Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
CAS: 7439-89-6
Ref. 02-040855
1Ea | To inquire |
Product Information
- 300A
- 3ZhP
- 4100Po434
- 9A4Ii
- Actino-iron
- Basf-Ew
- CM
- Ci-Cs
- Cip-Cm
- DH
- See more synonyms
- DKP
- EFV
- ES
- Eisen
- FEE
- Fe(HQ)
- Fer
- Ferricon
- Ferronyl
- Ferrovit
- HL
- HQ
- HS
- Hierro
- IronchipsNmmthickxmmxmm
- IronfoilNmmthickxmmwide
- IronlumpNxxmmanddownirregular
- IronpowderNmesh
- IronpowderNmicron
- Ironpowderelectrolytic
- Loha
- Metalet
- Mondi
- Nepy
- PZhO
- Pdr-Cm
- RKH
- S1640
- SM
- SQ
- Stainlesssteelfoiltypexmm
- Tec-Ball
Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Chemical properties
Technical inquiry about: 02-040855 Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
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