N-Hydroxynaphthalimide triflate
CAS: 85342-62-7
Ref. 3D-FH171200
| 1g | To inquire | ||
| 5g | To inquire | ||
| 500mg | To inquire |
Product Information
- Methanesulfonic acid, 1,1,1-trifluoro-, 1,3-dioxo-1H-benz[de]isoquinolin-2(3H)-yl ester
- 1H-Benz[de]isoquinoline-1,3(2H)-dione, 2-[[(trifluoromethyl)sulfonyl]oxy]-
- NAI 105
- N-(Trifluoromethylsulfonyloxy)-1,8-naphthalimide
N-Hydroxynaphthalimide triflate is a low molecular weight compound that can be used in lithography as an alternative to photoresist. It is a protonating agent that converts the hydroxyl group into a carboxylic acid and an amine. N-Hydroxynaphthalimide triflate has been shown to spontaneously form films at room temperature by exposure to ultraviolet light in the presence of oxygen or water vapor. The film can be prepared by coating a substrate with N-hydroxynaphthalimide triflate dissolved in dichloromethane and then exposing it to ultraviolet light. This technique can be used for patterning semiconductors, such as silicon wafers, for use in nanofiber devices.
Chemical properties
Technical inquiry about: 3D-FH171200 N-Hydroxynaphthalimide triflate
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