Product Information
- Carbamic acid, N-cyclohexyl-, (2-nitrophenyl)methyl ester
- o-Nitrobenzyl N-cyclohexyl carbamate
- (2-Nitrophenyl)methyl N-cyclohexylcarbamate
- Carbamic acid, cyclohexyl-, (2-nitrophenyl)methyl ester
- 2-Nitrobenzyl cyclohexanecarbamate
2-Nitrobenzyl cyclohexylcarbamate is a chemical that accelerates the chemical reaction of photoresist. It is used in industrial and photolithography processes to increase the rate of chemical reactions, such as acid concentration and photogenerated acidity. This chemical has been shown to accelerate the polymerization of epoxy resins in the presence of radiation, catalyzing the reaction kinetics. The onset of 2-Nitrobenzyl cyclohexylcarbamate is rapid, with a half-life of about 5 minutes.
Chemical properties
Technical inquiry about: 3D-UEA13703 2-Nitrobenzyl Cyclohexylcarbamate
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