CAS 12033-62-4
:Tantalum nitride (TaN)
Description:
Tantalum nitride (TaN) is a refractory compound known for its high melting point and excellent thermal stability, making it suitable for high-temperature applications. It typically appears as a dark brown to black powder or solid and is characterized by its hardness and resistance to oxidation. TaN exhibits semiconductor properties, which can be advantageous in various electronic applications, particularly in the fabrication of thin films for capacitors and other electronic devices. The compound is also known for its high density and good chemical resistance, particularly against acids, which enhances its utility in harsh environments. Tantalum nitride is often used in the production of hard coatings and as a diffusion barrier in microelectronics. Its unique properties make it a valuable material in the aerospace, electronics, and materials science fields. However, handling TaN requires caution due to its potential toxicity and the need for appropriate safety measures during processing and application.
Formula:NTa
InChI:InChI=1S/N.Ta
InChI key:InChIKey=MZLGASXMSKOWSE-UHFFFAOYSA-N
SMILES:N#[Ta]
Synonyms:- Mononitrure de tantale
- Mononitruro De Tantalo
- Tantalmononitrid
- Tantalum Mononitride
- Tantalum nitride
- Tantalum nitride Ta0.5N0.5
- Tantalum nitride Ta<sub>0.5</sub>N<sub>0.5</sub>
- nitridotantalum
- nitrogen(-3) anion
- tantalum(+5) cation
- Tantalum nitride (TaN)
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Found 4 products.
Tantalum nitride, 99.5% (metals basis)
CAS:<p>Tantalum nitride is used to create barrier or glue layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors a</p>Formula:TaNPurity:99.5%Molecular weight:194.95Ref: IN-DA003UHH
Discontinued product
