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CAS 12039-79-1

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Tantalum silicide (TaSi2)

Description:
Tantalum silicide (TaSi2) is a refractory compound known for its high melting point and excellent thermal stability, making it suitable for high-temperature applications. It typically exhibits a metallic luster and is characterized by its hardness and brittleness. TaSi2 has a tetragonal crystal structure and is often used in the semiconductor industry, particularly in the fabrication of integrated circuits, due to its favorable electrical conductivity and resistance to oxidation. Additionally, it serves as a diffusion barrier in metal interconnects. The compound is also noted for its good mechanical properties, which include high strength and resistance to wear, making it valuable in aerospace and other high-performance applications. Tantalum silicide can be synthesized through various methods, including solid-state reactions and chemical vapor deposition. However, handling requires caution due to its potential reactivity with strong oxidizers and the need for appropriate safety measures in industrial settings. Overall, TaSi2 is a significant material in advanced technology sectors, particularly in electronics and materials science.
Formula:Si2Ta
InChI:InChI=1/2H3Si.Ta/h2*1H3;/rH6Si2Ta/c1-3-2/h1-2H3
InChI key:InChIKey=MANYRMJQFFSZKJ-UHFFFAOYSA-N
SMILES:[Ta](#[Si])#[Si]
Synonyms:
  • Disiliciure de tantale
  • Disiliciuro De Tantalo
  • Tantaldisilicid
  • Tantalum Disilicide
  • Tantalum disilicide (TaSi2)
  • Tantalum disilicide (TaSi<sub>2</sub>)
  • Tantalum silicide
  • Tantalum silicide (TaSi<sub>2</sub>)
  • Tantalum silicide (99.5%-Ta)
  • Tantalum silicide (TaSi2)
  • Tantalumsilicidemeshgraypowderavgmicronsorle
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