CAS 12055-23-1
:Hafnium oxide
Description:
Hafnium oxide, also known as hafnia, is a chemical compound with the formula HfO₂. It is a white, crystalline solid that exhibits high thermal stability and is insoluble in water. Hafnium oxide has a high melting point and is known for its excellent dielectric properties, making it valuable in the electronics industry, particularly in the production of capacitors and as a gate dielectric in transistors. The compound is also characterized by its high refractive index and is used in optical coatings. Hafnium oxide can exist in different crystalline forms, including monoclinic, tetragonal, and cubic phases, with the tetragonal phase being stable at high temperatures. Additionally, hafnia is chemically resistant and can withstand harsh environments, which makes it suitable for applications in nuclear reactors and as a protective coating. Its unique properties also make it a candidate for use in advanced materials and nanotechnology. Overall, hafnium oxide is a versatile material with significant industrial and technological applications.
Formula:HfO2
InChI:InChI=1S/Hf.2O
InChI key:InChIKey=CJNBYAVZURUTKZ-UHFFFAOYSA-N
SMILES:[Hf](=O)=O
Synonyms:- Dioxido De Hafnio
- Dioxohafnium
- Dioxyde d'hafnium
- Hafnia
- Hafnia (HfO2)
- Hafnia (HfO<sub>2</sub>)
- Hafnium (IV)�oxide (99.998%-Hf) PURATREM
- Hafnium dioxide
- Hafnium dioxide (HfO2)
- Hafnium dioxide (HfO<sub>2</sub>)
- Hafnium oxide
- Hafnium oxide (HfO2)
- Hafnium oxide (HfO<sub>2</sub>)
- Hafnium(+4) Cation
- Hafniumdioxid
- Hafniumoxideoffwhitepowder
- Hafniumoxidesinteredlumps
- Hafnotrast
- Hf 05
- Hf 05 (oxide)
- Nsc 158931
- See more synonyms
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Found 19 products.
Hafnium(IV) oxide, 99.95%, (metals basis excluding Zr), Zr typically <0.5%
CAS:<p>Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi</p>Formula:HfO2Purity:0.5%Molecular weight:210.49Hafnium(IV) oxide, 99.9% (metals basis excluding Zr), Zr <0.5%
CAS:<p>Hafnium(IV) oxide is an intermediate. Hafnia is used in optical coatings, and as a high- dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and lab</p>Formula:HfO2Purity:0.5%Molecular weight:210.49Hafnium(IV) oxide, 99% (metals basis excluding Zr), Zr <1.5%
CAS:<p>Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi</p>Formula:HfO2Purity:1.5%Color and Shape:White, PowderMolecular weight:210.49Hafnium(IV) oxide, tech.
CAS:<p>Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi</p>Formula:HfO2Molecular weight:210.49Hafnium(IV) oxide, Spectrographic Grade, 99.9% (metals basis excluding Zr), Zr typically <80ppm
CAS:<p>Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi</p>Formula:HfO2Purity:99.9%Molecular weight:210.49Hafnium(IV) oxide, 99.995%, (metals basis excluding Zr), Zr typically <0.2%
CAS:<p>Hafnium(IV) oxide is used in optical coatings and in advanced metal-oxide-semiconductor devices. It is used as a gate insulator in field-effect transistors due to its high dielectric constant. It plays an important role as a possible candidate for resistive-switching memories, as a refractory materi</p>Formula:HfO2Purity:0.2%Molecular weight:210.49Hafnium(IV) oxide, 99.99% (metals basis excluding Zr), Zr <100ppm
CAS:<p>Hafnium(IV) oxide is used as Intermediates, Paint additives and coating additives, metal Products. And it is also used in optical coatings, as a refractory material in the insulation of such devices as thermocouples. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesa</p>Formula:HfO2Purity:99.99%Molecular weight:210.49Hafnium(IV) oxide, 98%
CAS:<p>Hafnium(IV) oxide, 98%</p>Formula:HfO2Purity:98%Color and Shape:off-white pwdr.Molecular weight:210.49Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM
CAS:<p>Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM</p>Formula:HfO2Purity:(99.995%-Hf, <0.15% Zr)Color and Shape:off-white pwdr.Molecular weight:210.49Hafnium(IV) oxide
CAS:Hafnium(IV) oxidePurity:99.99%,-200meshColor and Shape:Off-White PowderMolecular weight:210.49g/molHafnium(IV) oxide nanopowder, 70nm, 99.9%
CAS:Formula:HfO2Purity:≥ 99.9%Color and Shape:White to tan powder or crystalMolecular weight:210.49Hafnium oxide, 99+% (contains max. 4.5% Zr)
CAS:Formula:HfO2Purity:≥ 99.0% (sum of Hf and Zr oxides after calcination)Color and Shape:White powderMolecular weight:210.49Hafnium oxide, 99+% (contains max. 0.5% Zr)
CAS:Formula:HfO2Purity:≥ 99.0%Color and Shape:White to off-white powder or crystalsMolecular weight:210.49Hafnium oxide, 99.9%
CAS:Formula:HfO2Purity:≥ 99.9% (excluding Zr)Color and Shape:White to off-white powderMolecular weight:210.49Hafnium oxide, 99.9%
CAS:Formula:HfO2Purity:≥ 99.9% (excluding Zr)Color and Shape:White powderMolecular weight:210.49Ref: IN-DA00HFI1
Discontinued product
