Nickel silicide (NiSi2) is a binary compound formed from nickel and silicon, characterized by its metallic properties and semiconductor behavior. It typically appears as a gray or black solid and is known for its high thermal stability and good electrical conductivity, making it valuable in electronic applications, particularly in the fabrication of integrated circuits and as a contact material in semiconductor devices. NiSi2 has a relatively high melting point and exhibits a crystalline structure, which contributes to its robustness under various conditions. The compound is also notable for its ability to form at the interface of nickel and silicon during thermal processes, leading to the formation of a silicide layer that enhances the performance of electronic components. Additionally, nickel silicide can be synthesized through various methods, including solid-state reactions and chemical vapor deposition. Its properties make it an important material in the field of microelectronics and nanotechnology, where precise control over electrical characteristics is essential.

Nickel silicide (NiSi2)

12201-89-7: Nickel silicide (NiSi2) is a binary compound formed from nickel and silicon, characterized by its metallic properties and semiconductor behavior. It typically appears as a gray or black solid and is known for its high thermal stability and good electrical conductivity, making it valuable in electronic applications, particularly in the fabrication of integrated circuits and as a contact material in semiconductor devices. NiSi2 has a relatively high melting point and exhibits a crystalline structure, which contributes to its robustness under various conditions. The compound is also notable for its ability to form at the interface of nickel and silicon during thermal processes, leading to the formation of a silicide layer that enhances the performance of electronic components. Additionally, nickel silicide can be synthesized through various methods, including solid-state reactions and chemical vapor deposition. Its properties make it an important material in the field of microelectronics and nanotechnology, where precise control over electrical characteristics is essential.

CAS 12201-89-7

Nickel silicide (NiSi2)

Nickel silicide, 99%

Ref: 7W-GX5979