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CAS 13465-71-9

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Trifluorosilane

Description:
Trifluorosilane, with the chemical formula SiF3H, is a colorless gas at room temperature and pressure, characterized by its strong fluorine content. It is a silane derivative where three fluorine atoms are bonded to a silicon atom, making it highly reactive and a potent source of fluorine. Trifluorosilane is known for its ability to react with water, producing hydrofluoric acid and silanol, which can be hazardous. It has applications in the semiconductor industry, particularly in the deposition of silicon-based films and as a precursor for fluorinated silicon compounds. The substance is also utilized in organic synthesis and materials science. Due to its reactivity, trifluorosilane must be handled with care, as it can pose risks such as toxicity and corrosiveness. Proper safety measures, including the use of appropriate personal protective equipment and working in well-ventilated areas or fume hoods, are essential when dealing with this compound. Its unique properties make it a valuable chemical in various industrial applications, despite the challenges associated with its handling.
Formula:HF3Si
InChI:InChI=1/F3HSi/c1-4(2)3/h4H
SMILES:F[SiH](F)F
Synonyms:
  • Trifluorosilaneintetrafluorosilane
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