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CAS 13981-95-8

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Tantalum hydride (TaH)

Description:
Tantalum hydride (TaH) is a chemical compound formed between tantalum and hydrogen. It typically appears as a solid and is characterized by its metallic properties, which include high density and hardness. Tantalum hydride is known for its stability and resistance to oxidation, making it suitable for high-temperature applications. The compound can be synthesized through various methods, including the reaction of tantalum with hydrogen gas at elevated temperatures. Tantalum hydride exhibits interesting electronic properties, which can be attributed to the presence of tantalum's d-electrons. It is often studied for its potential applications in materials science, particularly in the development of superconductors and advanced electronic devices. Additionally, TaH can serve as a precursor for the production of tantalum metal and other tantalum-based compounds. However, handling tantalum hydride requires caution, as it can react with moisture and air, leading to the formation of hazardous byproducts. Overall, tantalum hydride is a compound of interest in both academic research and industrial applications due to its unique properties.
Formula:HTa
InChI:InChI=1S/Ta.H
InChI key:InChIKey=ARIDPXUNLFCABW-UHFFFAOYSA-N
SMILES:[TaH]
Synonyms:
  • Tantalum hydride (TaH)
  • Tantalum monohydride
  • Tantalum(5+) Pentahydride
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