CAS 15112-89-7

N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine

Description:

N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, with the CAS number 15112-89-7, is an organosilicon compound characterized by its unique structure that includes a silicon atom bonded to three nitrogen atoms, each of which is further bonded to methyl groups. This compound is typically a colorless to pale yellow liquid and is known for its high thermal stability and low volatility. It exhibits properties such as solubility in organic solvents and potential reactivity with various electrophiles due to the presence of nitrogen atoms. Hexamethylsilanetriamine is often utilized in the synthesis of silicone polymers and as a ligand in coordination chemistry. Its ability to form stable complexes with metals makes it valuable in catalysis and materials science. Additionally, it may have applications in the field of nanotechnology and as a precursor in the production of silicon-based materials. Safety precautions should be observed when handling this compound, as it may pose health risks if inhaled or ingested.

Formula: C₆H₁₉N₃Si

InChI: InChI=1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3

InChI key: InChIKey=TWVSWDVJBJKDAA-UHFFFAOYSA-N

SMILES: [SiH](N(C)C)(N(C)C)N(C)C

Synonyms:

• Brn 1901643
• Ls 1460
• N,N,N',N',N'',N''-Hexamethylsilanetriamine
• Silanetriamine, N,N,N',N',N'',N''-hexamethyl-
• Tri(dimethylamino)silane
• Tris(Dimethylamino)Silyl
• [Bis(dimethylamino)silyl]dimethylamine
• Tris(dimethylamino)silane

Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM

CAS: 15112-89-7

Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM

Formula: (CH₃)₂NSiH

Purity: (99.999%-Si)

Color and Shape: colorless to light yellow liq.

Molecular weight: 161.32

Ref: 08-14-8750

Silanetriamine, N,N,N',N',N'',N''-hexamethyl-

CAS: 15112-89-7

Formula: C₆H₁₉N₃Si

Purity: 95%

Color and Shape: Liquid

Molecular weight: 161.3207

Ref: IN-DA001N41

Tris(dimethylamino)silane

CAS: 15112-89-7

Tris(dimethylamino)silane

Purity: 99%, 99.999%-Si

Molecular weight: 161.32g/mol

Ref: 54-OR1044195

TRIS(DIMETHYLAMINO)SILANE

CAS: 15112-89-7

ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tris(dimethylamino)silane; Tris(dimethylamido)silylhydride; N,N,N',N',N'',N''-Hexamethylsilanetriamine
AIR TRANSPORT FORBIDDENVapor pressure, 4 °C: 1 6 mmHydrosilylates olefins in presence of Rh2Cl2(CO)4Reacts with ammonia to form silicon nitride prepolymersEmployed in low pressure CVD of silicon nitride

Formula: C₆H₁₉N₃Si

Purity: 97%

Color and Shape: Straw Liquid

Molecular weight: 161.32

Ref: 3H-SIT8714.0

Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD

CAS: 15112-89-7

Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD

Formula: (CH₃)₂NSiH

Purity: (99.999%-Si)

Color and Shape: colorless to light yellow liq.

Molecular weight: 161.32

Ref: 08-98-4035