CAS 594-27-4

Tetramethyltin

Description:

Tetramethyltin, with the CAS number 594-27-4, is an organotin compound characterized by its four methyl groups attached to a tin atom. It appears as a colorless to pale yellow liquid with a distinctive odor. This compound is known for its high volatility and low solubility in water, making it more soluble in organic solvents. Tetramethyltin is primarily used in organic synthesis and as a reagent in various chemical reactions. It exhibits toxicity, particularly to aquatic organisms, and poses environmental concerns due to its potential bioaccumulation. The compound can undergo hydrolysis in the presence of moisture, leading to the formation of tin oxides and other byproducts. Safety precautions are essential when handling tetramethyltin, as it can cause skin and respiratory irritation. Overall, while tetramethyltin has useful applications in chemistry, its environmental and health impacts necessitate careful management and regulation.

Formula: C₄H₁₂Sn

InChI: InChI=1S/4CH3.Sn/h4*1H3;

InChI key: InChIKey=VXKWYPOMXBVZSJ-UHFFFAOYSA-N

SMILES: [Sn](C)(C)(C)C

Synonyms:

• Tetramethyl tin
• Tetramethyletain
• Tetramethylstannan
• Tetramethylstannane
• Tetramethyltin
• Tetramethylzinn
• Tetrametilestano
• Tin, Tetramethyl-
• AI3-28458
• 4-04-00-04307 (Beilstein Handbook Reference)
• BRN 3647887
• Tetramethylcin
• Stannane, tetramethyl-
• Tetramethylcin [Czech]

Tetramethyltin, 98%

CAS: 594-27-4

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Formula: C₄H₁₂Sn

Purity: 98%

Color and Shape: Clear colorless, Liquid

Molecular weight: 178.85

Ref: 02-071145

Tetramethylstannane

CAS: 594-27-4

Applications Tetramethylstannane is used in preparation of Biphenyl Pyrazines as PD-1/PD-L1 inhibitors for treating cancer.
References Aktoudianakis, E., et al.: PCT Int. Appl., (2019);

Formula: C₄H₁₂Sn

Color and Shape: Colourless Oil

Molecular weight: 178.848

Ref: TR-T594270

TETRAMETHYLTIN

CAS: 594-27-4

ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetramethyltin; Tetramethylstannane
ΔHcomb: 903.5 kcal/molΔHform, gas, 27 °: -13.6 kcal/mol ΔHvap: 6.8 kcal/molSn-Me bond dissociation energy: 227 kJ/molEa, pyrolysis: 41.1 kcal/molVapor pressure, -21 °C: 10 mmVapor pressure, 20 °C: 90 mmAllows synthesis of even numbered alkanesConverts acid chlorides to methyl ketones with benzylchlorobis(triphenyl phosphine)palladiumForms aryl methyl ketones from aryl halides and CO in the presence of dicarbonylbis(triphenylphosphine)nickelFor CVD of tin oxide transparent conductive electrodes on glass for photovoltaics and sensorsPyrolyzed in vacuum to tin at 600-750 °CPyrolyzed oxidatively to SnO at 350-600 °CForms transparent conductive oxides for photovoltaics by Plasma-enhanced chemical vapor deposition (PECVD)Higher purity grade available, SNT7560.1

Formula: C₄H₁₂Sn

Purity: 97%

Color and Shape: Colourless Liquid

Molecular weight: 178.83

Ref: 3H-SNT7560

Stannane, tetramethyl-

CAS: 594-27-4

Formula: C₄H₁₂Sn

Purity: 96%

Color and Shape: Liquid

Molecular weight: 178.8391

Ref: IN-DA00IKH9

Tetramethyltin, 98%

CAS: 594-27-4

Formula: Sn(CH₃)₄

Purity: 98%

Color and Shape: colorless liq.

Molecular weight: 178.83

Ref: 08-50-1900