CAS 75-59-2
:Tetramethylammonium hydroxide
Description:
Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium compound with the chemical formula (CH₃)₄NOH. It is typically encountered as a colorless, viscous liquid or as a solid in its pure form. TMAH is highly soluble in water and polar organic solvents, making it a versatile reagent in various chemical applications. It acts as a strong base due to the presence of the hydroxide ion, which allows it to readily deprotonate acids. TMAH is commonly used in the semiconductor industry for photoresist development and as a catalyst in organic synthesis. Additionally, it can serve as a surfactant and is utilized in various laboratory applications. However, it is important to handle TMAH with care, as it is toxic and can cause severe skin and eye irritation. Proper safety measures, including the use of personal protective equipment, are essential when working with this compound. Its stability and reactivity make it a valuable tool in both industrial and research settings.
Formula:C4H12N·HO
InChI:InChI=1S/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1
InChI key:InChIKey=WGTYBPLFGIVFAS-UHFFFAOYSA-M
SMILES:[N+](C)(C)(C)C.[OH-]
Synonyms:- Ammonium Hydroxide, Tetramethyl-
- Ammonium, tetramethyl-, hydroxide
- Ar 300-49
- Az 300Mif
- Az 726
- Az 726Mif
- Az-Mif 300
- Cd 26
- Cpd 18
- Hidroxido De Tetrametilamonio
- Hydroxyde de tetramethylammonium
- Idrossido di tetrametilammonio
- L 09658
- Ldd 26
- Ldd 26W
- Megaposit CD 14
- Megaposit MF 24A
- Methanaminium, N,N,N-trimethyl-, hydroxide (1:1)
- Mf 24A
- Mf 319
- Mf 321
- Mf-Cd 26
- Microposit CD 26
- Microposit MF 319
- Microposit MF 321
- Microposit MF-CD 26
- Mif 726
- Nmd 3
- Nmw-W
- Ocg 934
- Ocg 945
- Ocg-Opd 262
- Opd 262
- Opd 5262
- Photoresist ma-D 525
- Prs 2000
- RD 6 (developer)
- Tetramethylammonium Hydroxide
- Tetramethylammoniumhydroxid
- Tmah
- Tmah 25
- Tokuso SD 20
- Tokuso SD 25
- Un3423
- テトラメチルアンモニウム=ヒドロキシド
- nmd3
- hydroxydedetetramethylammonium
- n,n,n-trimethyl-methanaminiuhydroxide
- N,N,N-Trimethylmethanaminium Hydroxide
- Methanaminium, N,N,N-trimethyl-, hydroxide
- megapositcd14
- Methanaminium,N,N,N-trimethyl-,hydroxide
- Tetramethyl ammonium hydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE SOL., 6% IN PROPYLENEGLYCOL
- tetramethyl-ammoniuhydroxide
- TETRAMETHYLAMMONIUM HYDROXIDE, 1.0M SOLN . IN H2O, A.C.S. REAGENT
- tetramethylammoniumhydroxide,10%solutioninwater
- Tetramethyl ammonium
- tetramethylammoniumhydroxide,solution
- TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION, ~10% IN WATER
- Tetramethylaminonium hydroxide
- ocg945
- TETRAMETHYLAMMONIUM HYDROXIDE, 10 WT. % SOLUTION IN WATER
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Found 20 products.
Tetramethylammonium Hydroxide (10% in Water)
CAS:Formula:C4H13NOColor and Shape:Colorless to Almost colorless clear liquidMolecular weight:91.15Tetramethylammonium Hydroxide (10% in Methanol) [for Photoresist Research]
CAS:Formula:C4H13NOColor and Shape:Colorless to Almost colorless clear liquidMolecular weight:91.15Tetramethylammonium Hydroxide (ca. 25% in Water)
CAS:Formula:C4H13NOColor and Shape:Colorless to Light yellow clear liquidMolecular weight:91.15Tetramethylammonium hydroxide, 1.0 M aq. soln., ACS
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Formula:C4H13NOColor and Shape:Colorless, LiquidMolecular weight:91.15Tetramethylammonium hydroxide, 25% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds appl</p>Formula:C4H13NOPurity:99.9999%Color and Shape:LiquidMolecular weight:91.15Tetramethylammonium hydroxide, 25% w/w in methanol
CAS:<p>Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanopart</p>Formula:C4H13NOColor and Shape:Clear colorless to pale yellow, LiquidMolecular weight:91.15Tetramethylammonium hydroxide, 2.38% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
CAS:<p>Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanopartic</p>Formula:C4H13NOPurity:99.9999%Molecular weight:91.15Tetramethylammonium hydroxide, 25% solution
CAS:Formula:C4H13NOColor and Shape:Clear, colourless to yellow solutionMolecular weight:91.15Tetramethylammonium Hydroxide (10% in Methanol)
CAS:Formula:C4H13NOColor and Shape:Colorless to Light yellow clear liquidMolecular weight:91.15Tetramethylammonium hydroxide, 10% aqueous solution
CAS:Formula:C4H13NOColor and Shape:Liquid, No data available.Molecular weight:91.154Tetramethylammonium Hydroxide (25% w/w solution in Water)
CAS:<p>Applications Tetramethylammonium Hydroxide is used to prepare a new family of silicate/aluminosilicate mesoporous molecular sieves.<br> Not a dangerous good if item is equal to or less than 1g/ml and there is less than 100g/ml in the package<br>References Beck, J., et al.: J. Am. Chem. Soc., 114, 10834 (1992).<br></p>Formula:C4H12N·HOColor and Shape:Single SolutionMolecular weight:91.15Tetramethylammonium Hydroxide-13C3
CAS:Controlled ProductFormula:CC3H12N•OHColor and Shape:NeatMolecular weight:77.12 + 17.008Tetramethylammonium hydroxide, 25% aqueous solution
CAS:<p>Tetramethylammonium hydroxide is a strong base that is used in analytical chemistry for the quantitative determination of zirconium. It is an analytical reagent and has a pH of 14. Tetramethylammonium hydroxide forms complexes with metals such as zirconium and titanium, which are then analyzed by various methods such as atomic absorption spectroscopy, x-ray fluorescence spectroscopy, and inductively coupled plasma mass spectrometry. The optimum concentration of tetramethylammonium hydroxide for this application is approximately 25%. Tetramethylammonium hydroxide reacts with p-nitrophenyl phosphate to form a pink product, which can be detected by colorimetric analysis. This reaction also produces hydrogen fluoride gas, which must be removed before the solution can be used again. Tetramethylammonium hydroxide reacts with ammonium to form tetramethylammonium ion and water. It also reacts</p>Formula:C4H13NOPurity:Min. 95%Color and Shape:Clear LiquidMolecular weight:91.15 g/molTetramethylammonium Hydroxide 25% aqueous solution pure
CAS:Formula:C4H13NOPurity:~25%Color and Shape:Clear, Colourless to pale yellow, LiquidMolecular weight:91.15Tetramethylammonium Hydroxide 25% in methanol pure
CAS:Formula:C4H13NOPurity:~25%Color and Shape:Clear, Pale yellow, LiquidMolecular weight:91.15Tetramethylammonium Hydroxide 10% Aq. Solution pure
CAS:Formula:C4H13NOPurity:~10%Color and Shape:Clear, Colourless to pale yellow tinted, LiquidMolecular weight:91.15Tetramethylammonium Hydroxide 25% aqueous solution, VLSI Semiconductor Grade
CAS:Formula:C4H13NOColor and Shape:Clear, Colourless, Liquid, < 10Molecular weight:91.15Tetramethylammonium Hydroxide 1M Aq. Solution ACS
CAS:Formula:C4H13NOColor and Shape:Clear, Colourless, Liquid, max. 10Molecular weight:91.15Tetramethylammonium Hydroxide 0.1N in isopropanol/ methanol extrapure
CAS:Formula:C4H13NOColor and Shape:Clear, Colourless to slight yellow tinted, LiquidMolecular weight:91.15








