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TITANIUM ISOPROPOXIDE
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TITANIUM ISOPROPOXIDE

CAS: 546-68-9

Ref. 3H-AKT872

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Estimated delivery in United States, on Wednesday 24 Apr 2024

Product Information

Name:
TITANIUM ISOPROPOXIDE
Synonyms:
  • 2-Propanol, Titanium Salt
  • 2-Propanol, titanium(4+) salt (4:1)
  • 5N
  • 5N (titanate)
  • A 1
  • A 1 (titanate)
  • Akt 872
  • Bistrater H-NDH 510C
  • Isopropyl alcohol, titanium(4+) salt
  • Isopropyl orthotitanate
  • See more synonyms
  • Isopropyl titanate(IV) ((C3H7O)4Ti)
  • Isopropyl titanate(IV) ((C<sub>3</sub>H<sub>7</sub>O)<sub>4</sub>Ti)
  • Jtw-Tpt
  • Ndh 510C
  • Orgatix TA 10
  • Orgatix TA 8
  • Orthotitanate, Tetraisopropyl
  • TPT
  • Ta 10
  • Tetraisopropanolate de titane
  • Tetraisopropanolato De Titanio
  • Tetraisopropanolatotitanium
  • Tetraisopropoxy Titanate
  • Tetraisopropoxytitanium
  • Tetraisopropoxytitanium(IV)
  • Tetraisopropyl orthotitanate
  • Tetraisopropyl titanate
  • Tetrakis(isopropanolato)titanium
  • Tetrakis(isopropoxide)titanium
  • Tetrakis(isopropoxy)titanium
  • Tetrakis(isopropylato)titanium(IV)
  • Tetrakis(isopropyloxy)titanium
  • Tilcom TIPT
  • Titan(Iv)-Isopropylat
  • Titanium Tetraisopropanolate
  • Titanium isopropoxide
  • Titanium isopropoxide (Ti(OC3H7)4)
  • Titanium isopropoxide (Ti(OC<sub>3</sub>H<sub>7</sub>)<sub>4</sub>)
  • Titanium isopropylate
  • Titanium tetraisopropoxide
  • Titanium tetraisopropylate
  • Titanium tetrakis(iso-propoxide)
  • Titanium tetrakis(isopropoxide)
  • Titanium(4+) isopropoxide
  • Titanium(IV) isopropoxide
  • Titanium(IV) isoproproxide
  • Titanium, tetrakis(1-methylethoxy)-
  • Titantetraisopropanolat
  • Tpta 1
  • Tyzor TPT
  • Vertec RJCE
  • Vertec TIPT
  • Vertec XI 900
  • Vertec XL 110
Description:

ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Titanium isopropoxide; Isopropyltitanate; Titanium tetra(2-propoxide); Tetraisopropyl titanate
Viscosity: 2 cStΔHform: -377 kcal/molΔHvap: 14.7 kcal/molMetal content: 16.6-16.9% TiVapor pressure, 50 °C: 0.9 mmVapor pressure, 100 °C: 19 mmSoluble: heptane, isopropanolMolecular complexity: 1.4Vapor phase pyrolysis gives oxideYields coatings of barium titanate in combination with Ba(OR)2Utilized in spray pyrolysis synthesis of BaTiO3 and SrTiO3Catalyst for rearrangement and cleavage of epoxy alcoholsCatalyst for cyclization of ω-amino acids to lactamsIn combination with lead alkyls yields lead zirconate titanate (PZT) films by Metal-Organic Chemical Vapour Deposition (MOCVD)In combination with triethylamine and trimethylchlorosilane extends aldehydes to two carbons to enalsProvides scratch-resistance for glass bottles by pyrolytic coating at 500 °C

Brand:
Gelest
Long term storage:
Notes:

Chemical properties

Molecular weight:
284.25
Formula:
C12H28O4Ti
Color/Form:
Pale Yellow Liquid
MDL:
Melting point:
Boiling point:
Flash point:
Density:
Concentration:
EINECS:
Merck:
HS code:

Hazard Info

UN Number:
EQ:
Class:
H Statements:
P Statements:
Forbidden to fly:
Hazard Info:
Packing Group:
LQ:

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