Product Information
- (TRISILYL)SLANE
Volatile Higher Silane
Volatile higher silanes are low temperature, high deposition rate precursors. By appropriate selection of precursor and deposition conditions, silicon deposition can be shifted from amorphous hydrogenated silicon toward microcrystalline silicon structures. As the number of silicon atoms increases beyond two, electrons are capable of sigma-sigma bond conjugation. The dissociative adsorption of two of the three hydrogen atoms on terminal silicon atoms has a lower energy barrier.
Isotetrasilane; (Trisilyl)silane; 2-Silyltrisilane
PYROPHORICAIR TRANSPORT FORBIDDEN?Hvap: 32.5 kJ/molPrecursor for low temp. epitaxy of doped crystalline siliconEmployed in low temperature CVD of amorphous silicon
Chemical properties
Technical inquiry about: 3H-SII6463.4 ISOTETRASILANE
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