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TETRAKIS(DIMETHYLAMINO)SILANE
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TETRAKIS(DIMETHYLAMINO)SILANE

CAS: 1624-01-7

Ref. 3H-SIT7276.0

25gDiscontinued

Discontinued product. For inquiries about similar products, please fill out our form or email us at .


Product Information

Name:
TETRAKIS(DIMETHYLAMINO)SILANE
Synonyms:
  • 4DMAS
  • N,N,N',N',N'',N'',N''',N'''-octamethylsilanetetramine
  • NSC 130238
  • Octamethylsilanetetramine
  • Silanetetramine, N,N,N′,N′,N′′,N′′,N′′′,N′′′-octamethyl-
  • Silanetetramine, octamethyl-
  • Tetra(dimethylamino)silane
  • Tetrakis(dimethylamido)silicon
  • Tetrakis(dimethylamino)silicon
Description:

ALD Material
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Tetrakis(dimethylamino)silane; Tetrakis(dimethylamido)silane; Octamethylsilanetetramine; N,N,N',N',N'',N'',N''',N'''-Octamethylsilanetetramine
Undergoes transamination reactionsReacts with chromophores to form NLO active hybrid organic-inorganics

Notice:
Our products are intended for lab use only. For any other use, please contact us.
Brand:
Gelest
Long term storage:
Notes:

Chemical properties

Molecular weight:
204.39
Formula:
C8H24N4Si
Purity:
97%
Color/Form:
Straw Liquid
MDL:
Melting point:
Boiling point:
Flash point:
Density:
Concentration:
EINECS:
Merck:
HS code:

Hazard Info

UN Number:
EQ:
Class:
H Statements:
P Statements:
Forbidden to fly:
Hazard Info:
Packing Group:
LQ:

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