Hafnium silicide (HfSi2) is a refractory compound known for its high melting point and excellent thermal stability, making it suitable for high-temperature applications. It typically appears as a gray or black solid and is characterized by its metallic luster. Hafnium silicide exhibits good electrical conductivity, which is advantageous in semiconductor applications. The compound is often utilized in the production of advanced materials, particularly in the aerospace and electronics industries, due to its ability to withstand extreme conditions. Hafnium silicide can form a solid solution with other silicides and is known for its high hardness and strength. Additionally, it has a relatively low density compared to other refractory materials, which is beneficial for weight-sensitive applications. Its chemical stability allows it to resist oxidation at elevated temperatures, although it can react with strong acids and bases. Overall, hafnium silicide is a significant material in the field of materials science and engineering, particularly in the development of high-performance components.

Hafnium silicide

12401-56-8: Hafnium silicide (HfSi2) is a refractory compound known for its high melting point and excellent thermal stability, making it suitable for high-temperature applications. It typically appears as a gray or black solid and is characterized by its metallic luster. Hafnium silicide exhibits good electrical conductivity, which is advantageous in semiconductor applications. The compound is often utilized in the production of advanced materials, particularly in the aerospace and electronics industries, due to its ability to withstand extreme conditions. Hafnium silicide can form a solid solution with other silicides and is known for its high hardness and strength. Additionally, it has a relatively low density compared to other refractory materials, which is beneficial for weight-sensitive applications. Its chemical stability allows it to resist oxidation at elevated temperatures, although it can react with strong acids and bases. Overall, hafnium silicide is a significant material in the field of materials science and engineering, particularly in the development of high-performance components.

They have been used as ohmic contacts, Schottky barrier contacts, gate electrodes, local interconnects, and diffusion barriers. FeSi2 has become the remarkable  source as high temperature thermoelectric material. It is also used as a powder in ceramic materials. This Thermo Scientific Chemicals bran

CAS 12401-56-8

Hafnium silicide

Hafnium silicide

Ref: 02-012564

Hafnium Silicide

Ref: 54-IN12206

Hafnium silicide, 99.5%

Ref: 7W-GX1173