CAS 19782-68-4
:TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV),
- Tetrakis(Dimethylamido)Hafnium(Iv), 99.99+%
- Hafnium Tetrakis(Dimethylazanide)
- Tetrakis(Dimethylamino)Hafnium
- Tetrakis(dimethylamido)hafnium(IV)
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
CAS:Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
Formula:Hf(N(CH3)2Purity:(99.99+%-Hr, <0.2%-Zr)Color and Shape:colorless to pale yellow xtl.Molecular weight:354.79Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok® cylinder (96-1071) for CVD/ALD
CAS:Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok® cylinder (96-1071) for CVD/ALD
Formula:Hf(N(CH3)2Purity:(99.99+%-Hr, <0.2%-Zr)Color and Shape:colorless to pale yellow xtl.Molecular weight:354.79Tetrakis(dimethylamino)hafnium
CAS:Controlled ProductTetrakis(dimethylamino)hafnium is a reactive metal oxide that can be used in the production of high-performance transparent electrodes. It reacts with water vapor to produce oxygen gas and hydrogen gas. This reaction is used to remove water vapor from the air and generate hydrogen gas, which is then collected for use as fuel. Tetrakis(dimethylamino)hafnium has a high resistance to corrosion by water vapor, making it suitable for use in environments where other metals would corrode quickly. It also has low thermal conductivity and a wide bandgap, making it suitable for use in electronics such as solar cells.
Formula:C8H24HfN4Purity:Min. 95%Molecular weight:354.79 g/molTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM
CAS:Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM
Formula:Hf(N(CH3)2Purity:(99.99+%-Hf, <0.2% Zr)Color and Shape:colorless to pale yellow xtl.Molecular weight:354.79

